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Physics of Thin Film Preparation - NBCM213

Title:	Fyzika přípravy tenkých vrstev
Guaranteed by:	Department of Macromolecular Physics (32-KMF)
Faculty:	Faculty of Mathematics and Physics
Actual:	from 2008 to 2016
Semester:	winter
E-Credits:	3
Hours per week, examination:	winter s.:2/0, Ex [HT]
Capacity:	unlimited
Min. number of students:	unlimited
4EU+:	no
Virtual mobility / capacity:	no
State of the course:	taught
Language:	Czech
Teaching methods:	full-time
Teaching methods:	full-time

Guarantor:	prof. Ing. Andrey Shukurov, Ph.D.

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Annotation -

Last update: T_KMF (23.05.2006)

Physical principals of methods of the thin film preparation in vacuum: vacuum evaporation, dc and rf sputtering, plasma deposition of inorganic and organic films, Survey non-vacuum deposition methods.

Syllabus -

Last update: prof. Ing. Andrey Shukurov, Ph.D. (06.10.2017)

1.Methods of thin films preparation in vacuum.

2. Fundamentals of physics of vacuum evaporation

3. Physical and technical basics of dc and rf sputtering

4. Basic sputtering arrangements, ion plating and methods using ion beams, basics of plasma assisted chemical vapor deposition, plasma polymerization, main methods of measurement of deposition rate and thickness of thin films.

5. Basic mechanisms of thin film growth, nucleation, growth and coalescence of islands, structural zone models and their application for nanostructures

6. Overview of non-vacuum deposition methods of thin films

7. Overview of methods of characterization of thin film properties