Low Temperature Plasma and Its Applications - NEVF501
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Kinetic desctription of plasma. Influence of the various types of interactions on the electron energy distribution function. Low-temperature plasma in the discharges. Influnce of the various processes and composition. Plasma treatment of surfaces, thin films deposition. This lecture is determined for the doctoral study, in the odd years only.
Last update: T_KEVF (18.05.2005)
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Podmínkou zakončení předmětu je úspěšné složení zkoušky. Last update: Pavlů Jiří, doc. RNDr., Ph.D. (14.06.2019)
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Kracík J., Tobiáš J.: Fyzika plazmatu, Academia Praha 1966. Raizer J. P.: Gas Discharge Physics, Springer Verlag, Berlin, Heidelberg, 1991. Ricard A.: Reactive plasmas, Paris 1996. Last update: T_KEVF (18.05.2005)
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Zkouška je ústní. Požadavky k jejímu složení odpovídají sylabu v rozsahu, který byl prezentován na přednášce. Z každého ze dvou tematických celků bude položena jedna otázka. Last update: Hrachová Věra, doc. RNDr., CSc. (12.10.2017)
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1. Kinetic description of low-temperature plasma
Solution of the kinetic equation, Focker-Planck collision term. Influence of the elastic and non-elastic collisions on the electron energy distribution function. Influence of the elektron-electron collision. Maxwellian and non-Maxwellian distributions of electrons. Magnetic field influence. Collision frequency. 2. Low-temperature discharge plasma and its application in the technologies Plasma in dc and ac discharges. Influence of the diffusion, recombination, beta and gamma processes on these discharge behaviour. Processes near the electrodes. Influence of chemically active milieu on the plasma processes (e.g., electronegative gases, cataphoresis, tec.). Ions and neutral particle interactions with surfaces. Plasma surface treatment (cathode sputtering, etching, sterilisation, tec.). Thin film deposition, various influence on the film properties. Computational modelling in the plasma chemistry.
Last update: T_KEVF (18.05.2005)
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