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Course, academic year 2018/2019
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Thin Film Techniques - NEVF103
Title in English: Technika tenkých vrstev
Guaranteed by: Department of Surface and Plasma Science (32-KFPP)
Faculty: Faculty of Mathematics and Physics
Actual: from 2005 to 2018
Semester: summer
E-Credits: 3
Hours per week, examination: summer s.:2/0 Ex [hours/week]
Capacity: unlimited
Min. number of students: unlimited
State of the course: taught
Language: Czech
Teaching methods: full-time
Guarantor: doc. RNDr. Ivan Ošťádal, CSc.
doc. RNDr. Pavel Sobotík, CSc.
Annotation -
Last update: T_KEVF (19.03.2003)
Basic concepts of termodynamic and vacuum physics. Growth types and phases of thin film growth. Overwiev of thin film deposition methods - CVD, vacuum evaporation, sputtering methods, laser ablation, electron beam ablation, principles, examples a comparison. Methods of thickness and deposition rate measurement. Methods for determination of morphology and composition of thin films. Adhesion and hardness of thin films. Preparation and cleaning of substrates for thin film technologies. Preparation of defined thin film structures - masking and litography.
Literature - Czech
Last update: T_KEVF (07.05.2005)

Krishna Seshan-editor.: Handbook of Thin-Film Deposition Processes and Techniques, Noyes Publications- William Andrew Publishing , Norwitch, New York 2002

Eckertová L.: Physics of Thin Films, Plenum Press, NY 1986

Requirements to the exam - Czech
Last update: doc. RNDr. Pavel Sobotík, CSc. (05.03.2018)

Zkouška probíhá ústní formou.

Požadavky odpovídají sylabu předmětu v rozsahu, který byl prezentován na přednášce.

Syllabus -
Last update: T_KEVF (07.05.2005)
1. Thin film deposition techniques -physical methods
Vacuum evaporation (equilibrium vapor pressure, evaporation rate, angular dependence of the evaporation flux, construction of evaporators , evaporation of alloys and compounds, electron beam evaporation, MBE). Sputtering (basic ideas, sputtering systems, magnetron, comparison of sputtering and evaporation). Laser ablation. Electron beam ablation. Ionised cluster beam deposition.

2. Thin film deposition techniques -chemical methods
CVD (decomposition, disproporciation, transport reactions,VLPCVD, PECVD, MOCVD). Anodic oxidation, LB films.

3. Methods of deposition rate measurement and thickness measurement
Measurement in a flux of vapors. Quartz oscilator technique. Optical methods (Tolansky method, FECO, spectral reflectivity measurements).

4. Techniques of measurement of thin film and surface morphology
TEM, SEM, STM, AFM, LEEM, FIM, FEM.

5. Techniques for determination of thin film structure and composition
Difrakční metody. Spektroskopie. Interakce s ionty (RBS, SIMS).

6. Substrate treatment
Chemical treatment. Etching. Annealing.

7. Litography, masking and nanopatterning
Ion etching. Selective etching. Using of photoresists.

8. Thin film properties
Hardness , adhesion and conductivity measurements.

 
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