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Course, academic year 2018/2019
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Modification of Surfaces and Its Applications - NBCM215
Title in English: Modifikace povrchů a její aplikace
Guaranteed by: Department of Macromolecular Physics (32-KMF)
Faculty: Faculty of Mathematics and Physics
Actual: from 2006
Semester: summer
E-Credits: 3
Hours per week, examination: summer s.:2/0 Ex [hours/week]
Capacity: unlimited
Min. number of students: unlimited
State of the course: taught
Language: Czech
Teaching methods: full-time
Guarantor: doc. Ing. Andrey Shukurov, Ph.D.
Annotation -
Last update: T_KMF (23.05.2006)
Intended changes of surface and interface properties are realized by methods that are summarized under the term: surface modification. The lecture introduces up-to-date survey of the modification methods aplicable to organic and inorganic materials and points out their use in technical and biomedical fields.
Aim of the course -
Last update: SHUKUROV/MFF.CUNI.CZ (14.04.2008)

The aim of the lecture is to give students a review of an up-to-date methods in area of surface modification. Modern technology in nanoindustry, microelectronics, food engineering, biotechnology etc will be in the center of attention.

Literature
Last update: SHUKUROV/MFF.CUNI.CZ (14.04.2008)

[1] Thin Film Processes, J. L. Vossen, W. Kern, eds., Academic Press, 1978, p. 564.

[2] Plasma Polymer Films, H. Biederman ed., Imperial College Press, 2004, p. 392.

Teaching methods -
Last update: SHUKUROV/MFF.CUNI.CZ (14.04.2008)

Lecture

Requirements to the exam - Czech
Last update: doc. Ing. Andrey Shukurov, Ph.D. (11.10.2017)

Zkouška je ústní. Podmínkou úspěšného složení je systematická docházka. Požadavky ke zkoušce odpovídají sylabu předmětu v rozsahu, který byl prezentován na přednášce.

Syllabus -
Last update: T_KMF (23.05.2006)

1) Basic terms: surface, interface, thin film in case of metals, semiconductors and dielectrics (inorganic and organic)

2) Survey of surface modification methods using wet chemistry processes

3) Vacuum methods of surface modification- general survey

4) Surface modification by means of low-pressure and atmospheric pressure plasma targeted on the changes of the structure and chemical composition of a surface.

5) Surface modification by depositing thin films - vacuum evaporation of thin films - early stages of thin film growth.

6) Surface modification by plasma deposition of inorganic thin film on metal, ceramic and polymer surface.

7) Surface modification by plasma polymerization and plasma etching

 
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