SubjectsSubjects(version: 845)
Course, academic year 2018/2019
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Physics of Thin Film Preparation - NBCM213
Title in English: Fyzika přípravy tenkých vrstev
Guaranteed by: Department of Macromolecular Physics (32-KMF)
Faculty: Faculty of Mathematics and Physics
Actual: from 2018
Semester: winter
E-Credits: 3
Hours per week, examination: winter s.:2/0 Ex [hours/week]
Capacity: unlimited
Min. number of students: unlimited
State of the course: taught
Language: Czech, English
Teaching methods: full-time
Guarantor: doc. Ing. Andrey Shukurov, Ph.D., Ph.D.
Annotation -
Last update: T_KMF (23.05.2006)
Physical principals of methods of the thin film preparation in vacuum: vacuum evaporation, dc and rf sputtering, plasma deposition of inorganic and organic films, Survey non-vacuum deposition methods.
Course completion requirements -
Last update: doc. Ing. Andrey Shukurov, Ph.D., Ph.D. (07.06.2019)

The examination is oral.

Literature -
Last update: doc. Ing. Andrey Shukurov, Ph.D., Ph.D. (29.04.2019)

H. Biederman, Plasma Polymer Films, Imperial College Press 2004, p. 386.

H. Biederman, Y. Osada, Plasma Polymerization Processes, Elsevier Science 1992, p. 210.

J. L. Vossen, W. Kern, Thin Film Processes II, Academic Press 2012, p. 888

Y. Huttel, Gas-Phase Synthesis of Nanoparticles, Wiley-VCH 2017, p. 395.

Requirements to the exam -
Last update: doc. Ing. Andrey Shukurov, Ph.D., Ph.D. (07.06.2019)

The exam is oral. A systematic attendance is a condition for successful completion. Requirements for the exam correspond to the syllabus of the course to the extent that was presented at the lecture.

Syllabus -
Last update: doc. Ing. Andrey Shukurov, Ph.D., Ph.D. (06.10.2017)

1. Methods of thin films preparation in vacuum.

2. Fundamentals of physics of vacuum evaporation

3. Physical and technical basics of dc and rf sputtering

4. Basic sputtering arrangements, methods using ion beams, basics of plasma assisted chemical vapor deposition, plasma polymerization.

5. Cluster beam deposition

6. Basic mechanisms of thin film growth, nucleation, growth and coalescence of islands, structural zone models and their application for nanostructures

7. Overview of non-vacuum deposition methods of thin films

8. Overview of methods of characterization of thin film properties

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