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Course, academic year 2023/2024
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Physical Methods of Nanostructure Technology - NEVF533
Title: Fyzikální metody technologie nanostruktur
Guaranteed by: Department of Surface and Plasma Science (32-KFPP)
Faculty: Faculty of Mathematics and Physics
Actual: from 2008
Semester: both
E-Credits: 3
Hours per week, examination: 2/0, Ex [HT]
Capacity: unlimited
Min. number of students: unlimited
4EU+: no
Virtual mobility / capacity: no
State of the course: taught
Language: Czech, English
Teaching methods: full-time
Teaching methods: full-time
Note: you can enroll for the course in winter and in summer semester
Guarantor: doc. RNDr. Pavel Sobotík, CSc.
prof. RNDr. Miloš Janeček, CSc.
Annotation -
Last update: T_KEVF (24.05.2007)
Methods of preparation of nanostructures - VPE, MBE, sputtering, laser ablatuion. Control of the growth, in-situ diagnostic. Growth modes a phases, 2D, 1D a 0D growth, adsorption and diffusion on surface. Steady-state nucleation theory of TF, Kinetic equations, KMC simulations of growth of low-dimensional objects. Litographic methods and nanomanipulations. Methods of preparation of metal nanocrystalline materials - ECAP, HPT, powder metallurgy.
Course completion requirements -
Last update: prof. RNDr. Miloš Janeček, CSc. (08.06.2019)

The subject is terminated by the exam(ination). The exam(ination) is oral. The requirements for the exam concide with the lecture syllabus.

Literature -
Last update: T_KEVF (24.05.2007)

Wolf, Edward L. Nanophysics and Nanotechnology, An Introduction to Modern Concepts in Nanoscience,

Wiley-VCH 2006

M. A. Herman, W. Richter, H. Sitter, Epitaxy: Physical Principles and Technical Implementation, Springer 2004.

Guozhong Cao: Nanostructures and Nanomaterials, Imp. Coll. Press 2004.

B.Bhushan (Ed.), Springer Handbook of nanotechnology, Springer 2007

Krishna Seshan-editor.: Handbook of Thin-Film Deposition Processes and Techniques, Noyes Publications- William Andrew Publishing , Norwitch, New York 2002

Venables J. A.: Surfaces and Thin Film Processes, Cambridge Univ. Press Cambridge 2000.

Michely T., Krug. J.: Islands, Mounds and Atoms, Springer-Verlag Berlin Heidelberg 2004

Shchukin V.A., Ledentsev N.N., Bimberg D., Epitaxy of Nanostructures, Springer 2004

Requirements to the exam - Czech
Last update: doc. RNDr. Jiří Pavlů, Ph.D. (14.06.2019)

Předmět je zakončen zkouškou. Zkouška probíhá ústní formou. Požadavky ke zkoušce odpovídají sylabu v rozsahu, který byl prezentován na přednášce.

Syllabus -
Last update: T_KEVF (24.05.2007)
1. Basic methods of nanotechnology.
Vacuum evaporation (basic ideas, construction of evaporators , evaporation of alloys and compounds, electron beam evaporation, MBE). Sputtering (basic ideas, sputtering systems, magnetron). Laser ablation. In-situ diagnostic.

CVD (decomposition, disproporciation, transport reactions), VLPCVD, PECVD, MOVPE. Anodic oxidation, LB films, molekular structures. Growt of 3D nanostructures by Focused Ion Beam (FIB-CVD)

2. Preparation techniques of metal nanocrystalline materials.
Methods and techniques of grain refinement in metallic materials, equal channel angular pressing (ECAP), high pressure torsion (HPT), acummulative roll-bonding (ARB), multi-directional forging, cyclic extrusion and compression, twist extrusion, inert gas condensation, ball-milling, powder metallurgy.

3.Growth of nanostructures.
Basic processes at deposition . Adsorption. Adatom movement in a surface potentia l- surface diffusion. Interaction of adatoms and clusters. The role of steps, defects and dopants.

Modes and phases of growth. Steady state nucleation theory. Kinetic equation of the growth. Thin film growth simulations. Kinetic versus thermodynamic.. Amorphous, polycrystalline a epitaxial films. The role of the stress? coherent Stranski-Krastanov growth. Selforganized growth of nanostructures. Growth 1D and 0D nanostructures on prepatterned surfaces.

4. Litography.
Basic principles. EUV litography, E-beam litography, nanoimprint lithography, stamping techniques. Ion etching. Micromachining

5. Nanomanipulations using STM and AFM techniques.
Basic principles of operation. Manipulation with single atoms and moleculesl, local anodic oxidation, AFM/STM litography.

 
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