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Course, academic year 2023/2024
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Selected Parts from Physics of Thin Films - NEVF109
Title: Vybrané partie z fyziky tenkých vrstev
Guaranteed by: Department of Surface and Plasma Science (32-KFPP)
Faculty: Faculty of Mathematics and Physics
Actual: from 2020
Semester: summer
E-Credits: 3
Hours per week, examination: summer s.:2/0, Ex [HT]
Capacity: unlimited
Min. number of students: unlimited
4EU+: no
Virtual mobility / capacity: no
State of the course: taught
Language: Czech
Teaching methods: full-time
Teaching methods: full-time
Guarantor: prof. RNDr. Karel Mašek, Ph.D.
doc. RNDr. Pavel Sobotík, CSc.
Annotation -
Last update: T_KEVF (07.05.2005)
The lecture is devoted to special aspects of homoepitaxial and heteroepitaxial thin film growth. Homoepitaxy - oriented growth, growth on singular and vicinal surfaces, growth on reconstructed surfaces, 2D-3D transition. Heteroepitaxy - heteroepitaxial growth of thin films, their physical and chemical properties and methods of analysis. Attention will be paid to metal-metal and metal-oxid systems. Role of the stress and surface reconstruction on film morphology (examples for metal-semiconductor and semiconductor-semiconductor systems). Selforganization.
Course completion requirements - Czech
Last update: doc. RNDr. Jiří Pavlů, Ph.D. (14.06.2019)

Podmínkou zakončení předmětu je úspěšné složení zkoušky, tj. hodnocení zkoušky známkou "výborně", "velmi dobře" nebo "dobře". Zkouška musí být složena v období předepsaném harmonogramem akademického roku, ve kterém student předmět zapsal.

Literature - Czech
Last update: T_KEVF (13.05.2005)

D.J.O'Connor, B.A.Sexton, R.St.C.Smart (Eds): Surface Analysis Methods in Materials Science, Springer 2003.

H. Luth: Solid Surfaces, Interfaces and Thin Films, Springer 2001.

Venables J. A.: Surfaces and Thin Film Processes, Cambridge Univ. Press Cambridge 2000.

Michely T., Krug. J.:Islands, Mounds and Atoms, Springer-Verlag Berlin Heidelberg 2004.

Requirements to the exam - Czech
Last update: doc. RNDr. Jiří Pavlů, Ph.D. (14.06.2019)

Zkouška je ústní a student dostává typicky dvě otázky ze sylabu předmětu v rozsahu, který byl prezentován na přednáškách.

Syllabus -
Last update: T_KEVF (13.05.2005)
1. Homoepitaxy
The role of the reconstruction . Step-flow growth and kinetic roughening. Magic islands - semiconductor and metal homoepitaxy.

2. Semiconductor-semiconductor and metal-semiconductor heteroepitaxy
The role of the stress. Dislocations. Growth of heterostructures - Stranski-Krastanov Growth. Quantum dots, wires and superlattices. Semiconductor lasers. Magnetic multilayers. GaAs epitaxy. Si-Ge heteroepitaxy, Metals on semiconductors - mixed reconstructions

3. Metal heteroepitaxy on metals and oxides
General aspects of metal epitaxy, metal alloys, ordered alloys, active getters. Active oriented metal clusters and their role in  heterogeneous catalysis. Gas sensors. Measurement of physical and chemical properties of heteroepitaxial systems using surface sensitive techniques, structure and morphology determination.

 
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